首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Ultrafast Carrier Dynamics of Silicon Nanowire Ensembles: The Impact of Geometrical Heterogeneity on Charge Carrier Lifetime
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Ultrafast Carrier Dynamics of Silicon Nanowire Ensembles: The Impact of Geometrical Heterogeneity on Charge Carrier Lifetime

机译:硅纳米线组件的超快载流子动力学:几何异质性对载流子寿命的影响

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Ultrafast carrier dynamics in silicon nanowires with average diameters of 40, 50, 60, and 100 nm were studied with transient absorption spectroscopy. After 388 nm photoexcitation near the direct band gap of silicon, broadband spectra from 400 to 800 nm were collected between 200 fs and 1.3 ns. The transient spectra exhibited both absorptive and bleach features that evolved on multiple time scales, reflecting contributions from carrier thermalization and recombination as well as transient shifts of the ground-state absorption spectrum. The initially formed "hot" carriers relaxed to the band edge within the first ~300 fs, followed by recombination over several hundreds of picoseconds. The charge carrier lifetime progressively decreased with decreasing diameter, a result consistent with a surface-mediated recombination process. Recombination dynamics were quantitatively modeled using the diameter distribution measured from each sample, and this analysis yielded a consistent surface recombination velocity of ~2 X 10~4 cm/s across all samples. The results indicate that transient absorption spectroscopy, which interrogates thousands of individual nanostructures simultaneously, can be an accurate probe of material parameters in inhomogeneous semiconductor samples when geometrical differences within the ensemble are properly analyzed.
机译:使用瞬态吸收光谱研究了平均直径为40、50、60和100 nm的硅纳米线中超快载流子动力学。在硅的直接带隙附近进行388 nm光激发后,在200 fs和1.3 ns之间收集了400至800 nm的宽带光谱。瞬态光谱具有在多个时间尺度上演化的吸收和漂白特征,反映了载流子热化和复合以及基态吸收光谱的瞬态位移的贡献。最初形成的“热”载流子在最初的约300 fs内弛豫到频带边缘,然后在数百皮秒内复合。载流子的寿命随着直径的减小而逐渐减小,其结果与表面介导的重组过程一致。使用从每个样品测得的直径分布对重组动力学进行定量建模,该分析在所有样品上产生了约2 X 10〜4 cm / s的一致表面重组速度。结果表明,同时分析成千上万个单个纳米结构的瞬态吸收光谱法可以正确地分析整体中的几何差异,从而准确地探测不均匀半导体样品中的材料参数。

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