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Comparison of SAM-Based Junctions with Ga2O3/EGaln Top Electrodes to Other Large-Area Tunneling Junctions

机译:带有Ga2O3 / EGaln顶部电极的SAM基结与其他大面积隧穿结的比较

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This paper compares the J(V) characteristics obtained for self-assembled monolayer (SAM)-based tunneling junctions with top electrodes of the liquid eutectic of gallium and indium (EGaIn) fabricated using two different procedures: (i) stabilizing the EGaln electrode in PDMS microchannels and (ii) suspending the EGaln electrode from the tip of a syringe. These two geometries of the EGaln electrode (with, at least when in contact with air, its solid Ga2O3 surface film) produce indistinguishable data. The junctions incorporated SAMs of SC_(n-1)CH3 (with n = 12, 14, 16, or 18) supported on ultraflat, template-stripped silver electrodes. Both methods generated high yields of junctions (70-85%) that were stable enough to conduct measurements of J(V) with statistically large numbers of data (N - 400-1000). The devices with the top electrode stabilized in microchannels also made it possible to conduct measurements of J(V) as a function of temperature, almost down to liquid nitrogen temperatures (T = 110-293 K). The J(V) characteristics were independent of T, and linear in the low-bias regime (-0.10 to 0.10V); the current density decreased exponentially with increasing thickness of the SAM. These observations indicate that tunneling is the main mechanism of charge transport across these junctions. Both methods gave values of the tunneling decay coefficient, β, of ~1.0 n_C~(-1) (~0.80 A~(-1)), and the pre-exponential factor, J0 (which is a constant that includes contact resistance), of ~3.0 X 10~2 A/cm~2. Comparison of the electrical characteristics of the junctions generated using EGaln by both methods against the results of other systems for measuring charge transport indicated that the value of β generated using EGaln electrodes is compatible with the consensus of values reported in the literature. Although there is no consensus for the value of J0, the value of J0 estimated using the Ga2O3/EGaIn electrode is compatible with other values reported in the literature. The agreement of experimental values of β across a number of experimental platforms provides strong evidence that the structures of the SAMs-including their molecular and supramolecular structure, and their interfaces with the electrodes-dominate charge transport in both types of EGaln junctions. These results establish that studies of J(V) characteristics of Ag~(TS)-SAM//Ga2O3/EGaIn junctions are dominated by the structure of the organic component of the SAM, and not by artifacts due to the electrodes, the resistance of the Ga2O3 surface film, or to the work functions of the metals.
机译:本文比较了自组装单层(SAM)基隧穿结与采用两种不同程序制造的镓和铟液态共晶(EGaIn)顶部电极获得的J(V)特性:(i)稳定EGaln电极PDMS微通道,以及(ii)从注射器尖端悬挂EGaln电极。 EGaln电极的这两种几何形状(至少在与空气接触时,其固体Ga2O3表面膜形成)无法区分数据。这些结点包含SC_(n-1)CH3(n = 12、14、16或18)的SAM,这些SAMs支撑在超扁平,剥离了模板的银电极上。两种方法均产生高结点(70-85%)的稳定性,足以进行具有统计大量数据(N-400-1000)的J(V)测量。具有在微通道中稳定的顶部电极的设备还使得可以进行随温度变化的J(V)测量,几乎可以测量到液氮温度(T = 110-293 K)。 J(V)特性与T无关,并且在低偏置状态下(-0.10至0.10V)呈线性关系。电流密度随着SAM厚度的增加呈指数下降。这些观察结果表明,隧穿是电荷在这些结之间传输的主要机制。两种方法都给出了约1.0 n_C〜(-1)(〜0.80 A〜(-1))的隧穿衰减系数β,以及指数前因子J0(包括接触电阻的常数)。 ,约为〜3.0 X 10〜2 A / cm〜2。通过两种方法使用EGaln生成的结的电学特性与其他用于测量电荷传输的系统的结果的比较表明,使用EGaln电极生成的β的值与文献报道的一致。尽管目前尚无关于J0值的共识,但使用Ga2O3 / EGaIn电极估算的J0值与文献中报道的其他值兼容。在许多实验平台上,β的实验值的一致性提供了有力的证据,证明SAM的结构(包括其分子和超分子结构,以及它们与电极的界面)在两种类型的EGaln结中均占主导地位。这些结果表明,Ag〜(TS)-SAM // Ga2O3 / EGaIn结的J(V)特性的研究主要由SAM的有机成分的结构决定,而不是由电极引起的伪像,电极的电阻决定。 Ga 2 O 3表面膜或金属的功函数。

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