Studies of Carbon Incorporation on the Diamond{100}Surface during Chemical Vapor Deposition using Density Functional Theory

摘要

Accurate potential energy surface calculations are presented for many of the key steps involved in diamond chemical vapor deposition on the{100}surface(in its 2X1 reconstructed and hydrogenated form).The growing diamond surface was described by using a large(~1500 atoms)cluster model,with the key atoms involved in chemical steps being described by using a quantum mechanical(QM,density functional theory,DFT)method and the bulk of the atoms being described by molecular mechanics(MM).The resulting hybrid QM/MM calculations are more systematic and/or at a higher level of theory than previous work on this growth process.The dominant process for carbon addition,in the form of methyl radicals,is predicted to be addition to a surface radical site,opening of the adjacent C-C dimer bond,insertion,and ultimate ring closure.Other steps such as insertion across the trough between rows of dimer bonds or addition to a neighboring dimer leading to formation of a reconstruction on the next layer may also contribute.Etching of carbon can also occur;the most likely mechanism involves loss of a two-carbon moiety in the form of ethene.The present higher-level calculations confirm that migration of inserted carbon along both dimer rows and chains should be relatively facile,with barriers of ~150 kJ mol~(-1)when starting from suitable diradical species,and that this step should play an important role in establishing growth of smooth surfaces.