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Electrostatic energy barriers from dielectric membranes upon approach of translocating DNA molecules

机译:DNA分子易位时介电膜的静电能垒

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We probe the electrostatic cost associated with the approach phase of DNA translocation events. Within an analytical theory at the Debye-Huckel level, we calculate the electrostatic energy of a rigid DNA molecule interacting with a dielectric membrane. For carbon or silicon based low permittivity neutral membranes, the DNA molecule experiences a repulsive energy barrier between 10 k(B)T and 100 k(B)T. In the case of engineered membranes with high dielectric permittivities, the membrane surface attracts the DNA with an energy of the same magnitude. Both the repulsive and attractive interactions result from image-charge effects and their magnitude survive even for the thinnest graphene-based membranes of size d approximate to 6 angstrom. For weakly charged membranes, the electrostatic energy is always attractive at large separation distances but switches to repulsive close to the membrane surface. We also characterise the polymer length dependence of the interaction energy. For specific values of the membrane charge density, low permittivity membranes repel short polymers but attract long polymers. Our results can be used to control the strong electrostatic energy of DNA-membrane interactions prior to translocation events by chemical engineering of the relevant system parameters. (C) 2016 AIP Publishing LLC.
机译:我们探究了与DNA易位事件接近阶段有关的静电成本。在Debye-Huckel层次的分析理论中,我们计算了与介电膜相互作用的刚性DNA分子的静电能。对于基于碳或硅的低介电常数中性膜,DNA分子会遇到10 k(B)T和100 k(B)T之间的排斥能垒。在具有高介电常数的工程膜的情况下,膜表面以相同量级的能量吸引DNA。排斥和吸引相互作用都是由图像电荷效应引起的,即使对于最薄的尺寸约为6埃的石墨烯基薄膜,其相互作用力也能幸免。对于带弱电荷的膜,静电能量在较大的分离距离处始终具有吸引力,但在接近膜表面时会排斥。我们还表征了相互作用能的聚合物长度依赖性。对于特定的膜电荷密度值,低介电常数的膜排斥短聚合物但吸引长聚合物。我们的结果可用于通过相关系统参数的化学工程来控制易位事件之前DNA-膜相互作用的强静电能。 (C)2016 AIP出版有限责任公司。

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