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首页> 外文期刊>The Journal of Chemical Physics >Si isotopic structure of the infrared absorption of the fully hydrogenated vacancy in silicon
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Si isotopic structure of the infrared absorption of the fully hydrogenated vacancy in silicon

机译:硅同位素结构对硅中完全氢化空位的红外吸收

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An infrared absorption spectrum consisting in three lines observed around 2223 cm~(-1) at liquid helium temperature characterizes a defect common in silicon crystals containing hydrogen. Several investigations of this spectrum have converged towards its assignment to a fully hydrogenated lattice vacancy defect V(Si-H)_4. However, the fact that the ratios of the intensities of the three lines have been reported to be proportional to the natural abundances of the three silicon isotopes suggests that only one Si atom is involved in the defect, apparently contradicting the above assignment. In this paper, the spectroscopic investigation of this defect is revisited and the Si-related isotopic structures of V(Si-H)_4 and V(Si-D)_4 defects are modeled. It is shown that the near proportionalities observed between the intensities of these lines and the abundances of the Si isotopes are fortuitous. Our analysis of the isotope dependence of the 2223 cm~(-1) line finds the V(Si-H)_4 model to be correct and that the model of a single interstitial Si atom complexed with H can be rejected. The investigation is extended to the analysis of tetra-hydrogenated vacancy trapped by a carbon atom.
机译:在液氦温度下,在2223 cm〜(-1)附近观察到的三条线组成的红外吸收光谱表征了常见的含氢硅晶体缺陷。对该光谱的一些研究已经趋向于将其分配给完全氢化的晶格空位缺陷V(Si-H)_4。但是,据报道,三条线的强度比与三种硅同位素的自然丰度成正比这一事实表明,缺陷中仅涉及一个硅原子,这显然与上述分配相矛盾。本文对这种缺陷进行了光谱学研究,并对V(Si-H)_4和V(Si-D)_4缺陷的硅相关同位素结构进行了建模。结果表明,在这些谱线的强度与Si同位素的丰度之间观察到接近的比例是偶然的。我们对2223 cm〜(-1)线的同位素依赖性的分析发现V(Si-H)_4模型是正确的,并且可以拒绝与H络合的单个填隙Si原子的模型。研究扩展到了碳原子捕获的四氢化空位的分析。

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