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首页> 外文期刊>The Journal of Chemical Physics >Modeling collective behavior of molecules in nanoscale direct deposition processes
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Modeling collective behavior of molecules in nanoscale direct deposition processes

机译:在纳米级直接沉积过程中模拟分子的集体行为

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We present a theoretical model describing the collective behavior of molecules in nanoscale direct deposition processes such as dip-pen nanolithography. We show that strong intermolecular interactions combined with nonuniform substrate-molecule interactions can produce various shapes of molecular patterns including fractal-like structures. Computer simulations reveal circular and starlike patterns at low and intermediate densities of preferentially attractive surface sites, respectively. At large density of such surface sites, the molecules form a two-dimensional invasion percolation cluster. Previous experimental results showing anisotropic patterns of various chemical and biological molecules correspond to the starlike regime. (c) 2006 American Institute of Physics.
机译:我们提供了一种理论模型,描述了在纳米级直接沉积工艺(例如浸笔式纳米光刻)中分子的集体行为。我们表明强大的分子间相互作用与不均匀的底物-分子相互作用相结合可以产生包括分形样结构在内的各种分子图案形状。计算机模拟揭示了分别在低密度和中等密度的优先吸引表面位置处的圆形和星形图案。在这样的表面位置的大密度下,分子形成二维侵入渗滤簇。先前的实验结果表明,各种化学和生物分子的各向异性模式与星形状态相对应。 (c)2006年美国物理研究所。

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