首页> 外文期刊>The Journal of Chemical Physics >The effect of nanocrystal surface structure on the luminescence properties:Photoemission study of HF-etched InP nanocrystals
【24h】

The effect of nanocrystal surface structure on the luminescence properties:Photoemission study of HF-etched InP nanocrystals

机译:纳米晶表面结构对发光性能的影响:HF刻蚀的InP纳米晶的光发射研究

获取原文
获取原文并翻译 | 示例
           

摘要

InP nanocrystals with narrow size distribution and mean particle diameter tunable from approx2 up to approx7 nm were synthesized via the dehalosilylation reaction between InCl_3 and tris(trimethylsilyl)phosphine.Specific capping of the nanocrystal surface with a shell of organic ligands protects the nanocrystals from oxidation and provides solubility of the particles in various organic solvents.InP nanocrystals with enhanced photoluminescence (PL) efficiency were obtained from the initial nanocrystals by photoassisted etching of the nanocrystal surface with HE The resulting PL quantum efficiency of InP nanocrystals dispersed in n-butanol is about three orders of magnitude higher when compared to the nonetched InP samples and approaches approx40% at room temperature.High-resolution photoelectron spectroscopy with the use of synchrotron radiation was applied to reveal the changes of the nanocrystal surface responsible for the dramatic improvement of the PL efficiency.The analysis of high-resolution P 2p core-level spectra confirmed significant changes of the nanocrystal surface structure induced by the postpreparative treatments and allowed us to propose the description of the etching mechanism.In the nonetched InP nanocrystals,some surface P atoms generate energy states located inside the band gap which provide nonradiative recombination pathways.Photoassisted treatment of InP nanocrystals with HF results in selective removal of these phosphorous atoms from the nanocrystal surface.The reconstructed surface of the etched InP nanocrystals is terminated mainly with In atoms and is efficiently passivated with tri-n-octylphosphine oxide ligands.
机译:通过InCl_3与三(三甲基甲硅烷基)膦之间的脱卤代硅烷化反应合成了InP纳米晶体,其粒径分布窄,平均粒径可在约2nm到约7nm范围内可调。通过使用HE对纳米晶体表面进行光辅助刻蚀,从初始纳米晶体中获得了具有增强的光致发光(PL)效率的InP纳米晶体。分散在正丁醇中的InP纳米晶体的PL量子效率约为3与未蚀刻的InP样品相比,其数量级要高几个数量级,并且在室温下约为40%。使用同步辐射的高分辨率光电子光谱技术用于揭示纳米晶表面的变化,从而极大地提高了PL效率。分析高分辨率的P 2p核能级谱证实了制备后处理引起的纳米晶体表面结构的显着变化,并允许我们提出刻蚀机理的描述。在未刻蚀的InP纳米晶体中,一些表面P原子在能带内产生能态用HF光辅助处理InP纳米晶体可导致从纳米晶体表面选择性去除这些磷原子。蚀刻后的InP纳米晶体的重建表面主要以In原子终止,并被三-n-钝化辛基膦氧化物配体。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号