Electron attachment in HBr and HCl

摘要

Studies of electron attachment in HBr and HCl gases at low temperatures have indicated that attachment to clusters of these gases can become efficient even though attachment ot the monomers is endothermic and exhibits very low attachment rates. A complementary measurement of the reaction of OH radicals with HBr has enabled us to establish a lower limit for the rate of electron atachment to HBr clusters of approximately 10~(-8) cm~3 s~(-1).