Process for the production of substantially HBr-free HCl gas and a substantially HBr-free aqueous HCl-solution

摘要

The invention relates to a process for preparing largely HBr-free HCl gas and largely HBr-free aqueous HCl solution, comprising the steps of: a) providing HBr-containing HCl gas; b) passing the HBr-containing HCl gas through aqueous HCl saturated with HCl solution; c) separating HBr-containing HCl saturated aqueous HCl solution; d) optionally, passing the obtained in step b) largely HBr-free HCl gas in water to obtain largely HBr-free aqueous HCl solution; wherein optionally generated in step d) largely HBr-free aqueous HCl solution is performed in step b) of the process.; The inventive method highly pure aqueous HCl solution for use in the semiconductor industry can be produced inexpensively and on an industrial scale. However, the purified HCl gas obtained by the steps a) to c) can be used for any other purposes. The invention is also an apparatus for carrying out the method according to the invention.