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首页> 外文期刊>Talanta: The International Journal of Pure and Applied Analytical Chemistry >Evolution of morphology in electrodeposited nanocrystalline Co–Ni films by in-situ high magnetic field application
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Evolution of morphology in electrodeposited nanocrystalline Co–Ni films by in-situ high magnetic field application

机译:原位强磁场作用下电沉积纳米Co-Ni薄膜的形貌演变

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摘要

The effect of high magnetic fields up to 12 T, applied during electrodeposition process, on the morphology of nanocrystalline CoNi films has been investigated. The magneto-induced dramatic modifications in the morphology were observed by using field-emission scanning electronic micro- scopy and atomic force microscopy. Along with the increase of magnetic flux density (B), the grain size and the surface roughness of the films increased to reach a maximum value at a field of 9 T. Meanwhile, higher magnetic flux density could improve cobalt atomic percentage in the film due to the impacts of magnetohydrodynamic effect. However, at a high field of 12 T, the paramagnetic force played a predominant role in a decrease of mass transport, resulting in minimum grain size and roughness, even smaller than that of the ordinarily (B=0 T) sample.
机译:研究了电沉积过程中施加的高达12 T的高磁场对纳米CoNi薄膜形貌的影响。通过使用场发射扫描电子显微镜和原子力显微镜观察了磁致形态的显着改变。随着磁通密度(B)的增加,薄膜的晶粒尺寸和表面粗糙度在9 T的场上达到最大值。同时,较高的磁通密度可以提高薄膜中钴的原子百分含量,这是因为磁流体动力效应的影响。但是,在12 T的高磁场下,顺磁力在质量传递的减少中起主要作用,导致最小的晶粒尺寸和粗糙度,甚至小于普通(B = 0 T)样品的晶粒尺寸和粗糙度。

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