Key Laboratory of EPM(Ministry of Education),Northeastern University,Shenyang,110004,China;
LISM,Université de Reims Champagne-Ardenne,B.P.1039,51687 Reims Cedex 2,France;
Key Laboratory of EPM(Ministry of Education),Northeastern University,Shenyang,110004,China;
Key Laboratory of EPM(Ministry of Education),Northeastern University,Shenyang,110004,China;
LISM,Université de Reims Champagne-Ardenne,B.P.1039,51687 Reims Cedex 2,France;
Key Laboratory of EPM(Ministry of Education),Northeastern University,Shenyang,110004,China;
Electrodeposition; CoNiP films; High magnetic field annealing; Grain size; Phase transformation;
机译:强磁场退火取决于纳米晶Co / Ni双层薄膜的形貌和微观结构
机译:场退火对电沉积Co_(0.3)Fe_(0.7)薄膜微结构,磁和微波性能的影响
机译:脉冲电沉积纳米晶Ni和Co的分形孔分布和磁微结构。没有。 054408
机译:高磁场退火对脉冲电沉积纳米晶体CO-Ni-P膜微观结构的影响
机译:感应加热的铁磁薄膜对多晶硅微结构的局部退火。
机译:微观结构对场增强的影响锂离子纳米晶金刚石薄膜的电子发射特性植入和退火工艺
机译:磁场退火对高电感的Fecunbsib纳米晶体磁芯组织和磁性的影响
机译:组分和场退火对FeCo基非晶和纳米晶合金磁性能的影响