首页> 外文期刊>Physical Review, B. Condensed Matter >Influence of high-energy electron irradiation on the formation and annihilation of the photoluminescence W center and the center's origin in a proton-implanted silicon crystal - art. no. 155204
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Influence of high-energy electron irradiation on the formation and annihilation of the photoluminescence W center and the center's origin in a proton-implanted silicon crystal - art. no. 155204

机译:高能电子辐照对质子注入硅晶体中光致发光W中心的形成和an灭以及中心起源的影响-艺术。没有。 155204

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摘要

The population change of the photoluminescence (PL) W center (or I-I center) with 2-MeV electron irradiation in proton-implanted silicon crystal was observed to investigate the origin of the center. While a straightforward annihilation of the W centers formed by proton implantation with an increase of the electron fluence was observed in the low fluence region, the number of centers increased in the high fluence region (>2x10(18) electron/cm(2)) due to the predominance of formation over annihilation. The annihilation and formation of the W centers were analyzed as first and second order with respect to the numbers of vacancies and self-interstitials, respectively. The efficiency of the W-center formation from element pairs produced by electron irradiation was much smaller than that for ion implantation. Considering the findings obtained in the present study and those given by other studies, the <111> split monointerstitial and the <111> ST di-interstitial (ST: split triple) were chosen as the probable candidates for the W center. [References: 38]
机译:观察到2-MeV电子辐照质子注入硅晶体中的光致发光(PL)W中心(或I-I中心)的人口变化,以研究中心的起源。虽然在低能量密度区域观察到了质子注入形成的W中心的灭并伴随着电子能量密度的增加,但在高能量密度区域中中心的数量却增加了(> 2x10(18)electronic / cm(2))。由于在over灭中占主导地位。 W中心的灭和形成分别以空位和自填隙的数量分析为一阶和二阶。由电子辐照产生的元素对形成W中心的效率远小于离子注入的效率。考虑到本研究和其他研究得出的结果,选择了<111>分裂单间隙和<111> ST二间隙(ST:分裂三重)作为W中心的候选对象。 [参考:38]

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