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Discrete and continuous spectrum of nitrogen-induced bound states in heavily doped GaAs1-xNx - art. no. 085205

机译:重掺杂GaAs1-xNx中氮诱导的键合态的离散和连续光谱-艺术。没有。 085205

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We perform a spectroscopic study on GaAs1-xNx samples with N concentrations near an important value of x=0.1%, an intermediate concentration between the impurity limit and the alloy region. We find that near x similar to0.1%, samples exhibiting seemingly different spectra as reported in the literature and observed in our measurements actually have the same underlying electronic structure. Namely, the shallow N-induced bound states have already formed an impurity band and thus led to an observable band-gap reduction, but deeper N-related bound states persist as discrete levels below the newly formed band edge. The role of these discrete states in the formation of the new band edge on further increasing the N doping levels is discussed. We point out that although the nitrogen bound states form an impurity band in heavily N-doped GaAs, the states constituting such a newly formed band continue to retain certain localization characteristics of the impurity in the dilute limit. We observe that the impurity band gives rise to strong resonant Raman scattering, which makes it possible To obtain the resonant Raman profile near the direct band edge of this direct-gap semiconductor. [References: 47]
机译:我们对GaAs1-xNx样品进行了光谱学研究,样品中N浓度接近x = 0.1%的重要值,这是杂质极限和合金区域之间的中间浓度。我们发现,x接近0.1%,样品显示的光谱似乎与文献中报道的不同,并且在我们的测量中观察到的样品实际上具有相同的基础电子结构。即,浅的N诱导的束缚态已经形成了杂质带,因此导致可观察到的带隙减小,但是较深的N相关的束缚态在新形成的带边缘以下以离散能级持续存在。讨论了这些离散态在进一步增加N掺杂水平时在形成新的能带边缘中的作用。我们指出,尽管氮结合态在重掺杂N的GaAs中形成杂质带,但构成这种新形成的能带的状态在稀释极限内继续保留杂质的某些局部化特征。我们观察到,杂质带引起强烈的共振拉曼散射,这使得有可能在该直接隙半导体的直接带边缘附近获得共振拉曼轮廓。 [参考:47]

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