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Instability of the high-pressure CsCl structure in most III-V semiconductors

机译:大多数III-V半导体中高压CsCl结构的不稳定性

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摘要

Using the density-functional linear response method, we study dynamical instabilities of the high-pressure CsCl phase in III-V semiconductors. For InSb, we find no phonon instability that could prevent the CsCl phase from forming, consistent with the experimental observation. In contrast, for the more ionic GaP, GaAs, InP, and InAs, we find that, while statically stable, the CsCl phase is dynamically unstable at high pressures with respect to transverse-acoustic [xi xi 0] phonons. Analysis of the soft normal modes via "isotropy subgroup" suggests two candidate structures that will replace CsCl structure at high pressure: the tP4 (B10) InBi type and the oP4 (B19) AuCd type. Experimental examination of these predictions is called for. [References: 31]
机译:使用密度泛函线性响应方法,我们研究了III-V族半导体中高压CsCl相的动力学不稳定性。对于InSb,我们发现没有声子不稳定性可以阻止CsCl相的形成,这与实验观察一致。相反,对于更具离子性的GaP,GaAs,InP和InAs,我们发现,尽管CsCl相是静态稳定的,但在高压下相对于横向声[xi xi 0]声子却是动态不稳定的。通过“各向同性亚组”对软正态模态的分析表明,在高压下将取代CsCl结构的两种候选结构:tP4(B10)InBi型和oP4(B19)AuCd型。需要对这些预测进行实验检查。 [参考:31]

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