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首页> 外文期刊>Physical Review, B. Condensed Matter >Inhomogeneous structure in hydrogenated tetrahedral amorphous carbon thin films
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Inhomogeneous structure in hydrogenated tetrahedral amorphous carbon thin films

机译:氢化四面体非晶碳薄膜的不均匀结构

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摘要

The structure of hydrogenated tetrahedral amorphous carbon (ta-C:H) thin film was investigated by observing variations in film stress and mass density as a function of the film thickness. Cross-sectional transmission electron microscopy clearly shows an inhomogeneous microstructure that includes a region near the substrate/film interface with a higher density than the remainder of the film. It is postulated that surface charge accumulation of the insulating coating reduces the energy of the incoming ions. Lower-energy ion bombardment results in a ta-C:H film with both reduced stress and mass density. [S0163-1829(99)05520-4]. [References: 14]
机译:通过观察薄膜应力和质量密度随薄膜厚度的变化,研究了氢化四面体无定形碳(ta-C:H)薄膜的结构。横截面透射电子显微镜清楚地显示出不均匀的微观结构,该微观结构包括靠近衬底/膜界面的区域,其密度高于膜的其余部分。据推测,绝缘涂层的表面电荷积累会降低进入离子的能量。较低能量的离子轰击会导致ta-C:H薄膜的应力和质量密度降低。 [S0163-1829(99)05520-4]。 [参考:14]

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