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Anomalous relaxations and chemical trends at III-V semiconductor nitride nonpolar surfaces

机译:III-V半导体氮化物非极性表面的异常弛豫和化学趋势

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摘要

Relaxations at nonpolar surfaces of semiconductor III-V compounds result from a competition between dehybridization and charge transfer. First-principles calculations for the (110) and (10 (1) over bar 0) faces of zinc-blende and wurtzite AlN, GaN, and InN reveal an anomalous behavior as compared with ordinary III-V semiconductors. Additional calculations for GaAs and ZnO suggest close analogies with the latter. We interpret our results in terms of the larger ionicity (charge asymmetry) and bonding strength (cohesive energy) in the nitrides with respect to other III-V compounds, both essentially due to the strong valence potential and absence of p core states in the lighter anion. The same interpretation applies to Zn IT-VI compounds. [S0165-1829(99)00211-8]. [References: 29]
机译:半导体III-V化合物在非极性表面的弛豫是由去杂化和电荷转移之间的竞争引起的。与普通的III-V半导体相比,闪锌矿和纤锌矿型AlN,GaN和InN的(110)和(10(1)在0条上)面的第一性原理计算显示出异常行为。 GaAs和ZnO的其他计算表明与后者非常相似。我们根据氮化物相对于其他III-V化合物的更大的离子性(电荷不对称性)和键合强度(内聚能)来解释我们的结果,这主要归因于较强的化合价和较轻的p核态阴离子。 Zn IT-VI化合物也适用相同的解释。 [S0165-1829(99)00211-8]。 [参考:29]

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