...
首页> 外文期刊>Physical Review, B. Condensed Matter >Self-consistent quantum Monte Carlo simulations of the structure of the liquid-vapor interface of a eutectic indium-gallium alloy
【24h】

Self-consistent quantum Monte Carlo simulations of the structure of the liquid-vapor interface of a eutectic indium-gallium alloy

机译:共晶铟镓合金液-气界面结构的自洽量子蒙特卡罗模拟

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

We report the results of self-consistent quantum Monte Carlo simulations of the density distribution along the normal to the liquid-vapor interface, and the in-plane structure function, of the liquid-vapor interface of a eutectic binary alloy of indium and gallium (16.5% In) at 86 degrees C. The density distribution along the normal to the interface exhibits layering, with a sensibly complete monolayer of In outermost in the interface. Our results are in good agreement with the experimental data of Regan et al. [Phys. Rev. B 55, 15874 (1997)]. We also report the results of self-consistent quantum Monte Carlo simulations of the structure of the liquid-vapor interfaces of In:Ga alloys with In concentrations greater than and less than the eutectic concentration. The In atoms segregate in the outermost layer of the interface as a sensibly complete monolayer when the bulk In concentration is 25% and as a partial monolayer when the bulk In concentration is 11%. In these cases, as well as for the eutectic alloy, there is some Ga well mixed with the In in the outermost layer of the stratified liquid-vapor interface. And for all alloy compositions studied the layer of the interface beneath the monolayer of segregated In is deficient in In relative to the bulk concentration; the bulk concentration of In is reached in the third layer of the liquid-vapor interface. [References: 38]
机译:我们报告了铟和镓的低共熔二元合金沿液-气界面法线的密度分布以及液-气界面的面内结构函数的自洽量子蒙特卡罗模拟结果(在86摄氏度时为16.5%In)。沿界面法线的密度分布表现为分层,在界面的最外层具有明显完整的In单层。我们的结果与Regan等人的实验数据非常吻合。 [物理B 55,15874(1997)。我们还报告了In浓度大于和小于共晶浓度的In:Ga合金的液-气界面结构的自洽量子蒙特卡罗模拟结果。当本体In浓度为25%时,In原子在界面的最外层中分离为感觉上完整的单层,而在本体In浓度为11%时,In原子作为部分单层离析。在这些情况下,以及对于低共熔合金,在层状液汽界面的最外层中,一些Ga与In混合良好。并且对于所有研究的合金成分,相对于整体浓度,偏析的In的单层下面的界面层的In都不足。在液-气界面的第三层中达到In的整体浓度。 [参考:38]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号