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Local atomic structure in strained interfaces of InxGa1-xAs/InP heterostructures

机译:InxGa1-xAs / InP异质结构的应变界面中的局部原子结构

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We present a structural study of the interfaces between InxGa1-xAs and InP (and vice verse) by x-ray absorption fine structure spectroscopy (XAFS); the samples investigated are a set of nominally matched InxGa1-xAs/InP short-period superlattices. We find that the coordination numbers around As and Ga deviate significantly from those expected in an abrupt superlattice structure even if interface bonds are taken into account; this demonstrates the presence of unwanted interface layers between InP and InxGaxAs (and vice versa). Based on the growth sequence employed and on indications from other techniques, we model the structure as composed of the two nominal layers plus InAsxP1-x and In0.53Ga0.47As1-yPy strained interface layers. XAFS is a chemically sensitive probe of the local structure in these strained layers; We find that each bond length measured (As-In, Ga-As, and Ga-P) has a different value, with small variations among the different samples. This implies the presence of structural distortions that accommodate strain at the local level. We find good agreement between the XAFS results and high-resolution x-ray diffraction data that probe the structure in an average way. The results are discussed also with reference to the problem of the band offsets at InxGa1-xAs/InP heterojunctions and to theoretical simulations. [S0163-1829(98)05539-8]. [References: 43]
机译:我们通过X射线吸收精细结构光谱法(XAFS)对InxGa1-xAs和InP之间(以及相反)之间的界面进行结构研究;研究的样品是一组名义上匹配的InxGa1-xAs / InP短周期超晶格。我们发现,即使考虑了界面键,As和Ga周围的配位数与突变的超晶格结构中的预期配位数也显着不同。这证明了InP和InxGaxAs之间存在有害的接口层(反之亦然)。基于所采用的生长顺序和其他技术的指示,我们将结构建模为由两个标称层以及InAsxP1-x和In0.53Ga0.47As1-yPy应变界面层组成。 XAFS是这些应变层中局部结构的化学敏感探针。我们发现,测量的每个键长(As-In,Ga-As和Ga-P)具有不同的值,不同样品之间的差异很小。这意味着存在结构变形,该变形在局部水平上承受了应变。我们发现XAFS结果与以平均方式探测结构的高分辨率X射线衍射数据之间达成了良好的一致性。还参考InxGa1-xAs / InP异质结处的带偏移问题和理论仿真来讨论结果。 [S0163-1829(98)05539-8]。 [参考:43]

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