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首页> 外文期刊>Physics Letters, A >Threading dislocation densities in semiconductor crystals: A geometric approach
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Threading dislocation densities in semiconductor crystals: A geometric approach

机译:半导体晶体中的螺纹位错密度:一种几何方法

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摘要

In this Letter, we introduce a geometric model to explain the origin of the observed shallow levels in semiconductors threaded by a dislocation density. We show that a uniform distribution of screw dislocations acts as an effective uniform magnetic field which yields bound states for a spin-half quantum particle, even in the presence of a repulsive Coulomb-like potential. This introduces energy levels within the band gap, increasing the carrier concentration in the region threaded by the dislocation density and adding additional recombination paths other than the near band-edge recombination.
机译:在这封信中,我们介绍了一个几何模型来解释由位错密度穿入的半导体中观察到的浅能级的起源。我们显示出,即使在存在排斥性库仑势的情况下,螺旋位错的均匀分布也可以作为有效的均匀磁场,产生自旋半量子粒子的束缚态。这在带隙内引入了能级,从而增加了由位错密度穿过的区域中的载流子浓度,并增加了除近带边复合以外的其他复合路径。

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