...
首页> 外文期刊>Physica, B. Condensed Matter >Structural and luminescence properties of SrAl2O4:Eu2+,Dy3+,Nd3+ phosphor thin films grown by pulsed laser deposition
【24h】

Structural and luminescence properties of SrAl2O4:Eu2+,Dy3+,Nd3+ phosphor thin films grown by pulsed laser deposition

机译:脉冲激光沉积生长SrAl2O4:Eu2 +,Dy3 +,Nd3 +荧光粉薄膜的结构和发光特性

获取原文
获取原文并翻译 | 示例
           

摘要

Thin films of Eu2+ doped and Dy3+,Nd3+ co-doped Strontium Aluminate (SrAl2O4:Eu2+,Dy3+,Nd3+) phosphors were grown on Si(100) substrates by a pulsed laser deposition (PLD) technique using a 266 nm Nd:YAG pulsed laser under varying substrate temperature and the working atmosphere during the film deposition process. The effect of substrate temperatures and argon partial pressure on the structure and luminescence properties of the as-deposited SrAl2O4:Eu2+,Dy3+,Nd3+ phosphor thin films were analysed. XRD patterns showed that with increasing substrate temperature and argon partial pressure the peaks in the direction (220) shifted to the lower 2-theta angles. Photoluminescence (PL) data collected in air at room temperature revealed a slight shift in the peak wavelength of the PL spectra observed from the thin films when compared to the PL spectra of the phosphor in powder form, which is probably due to a change in the crystal field. The PL intensity of the samples was highest for 100 degrees C substrate temperature and 20 mTorr argon partial pressure. Due to this, the effect of argon partial pressure was studied at a constant substrate temperature of 100 degrees C while the effect of Substrate temperatures recorded at 20 mTorr argon pressure respectively. (C) 2015 Elsevier B.V. All rights reserved.
机译:通过使用266 nm Nd:YAG脉冲激光通过脉冲激光沉积(PLD)技术在Si(100)衬底上生长Eu2 +掺杂和Dy3 +,Nd3 +共掺杂的铝酸锶(SrAl2O4:Eu2 +,Dy3 +,Nd3 +)荧光粉的薄膜。在成膜过程中,在变化的基板温度和工作气氛下进行。分析了衬底温度和氩分压对沉积的SrAl2O4:Eu2 +,Dy3 +,Nd3 +荧光粉薄膜结构和发光性能的影响。 XRD图谱表明,随着衬底温度和氩分压的增加,在方向(220)上的峰移向较低的2θ角。室温下在空气中收集的光致发光(PL)数据显示,与粉末形式的荧光粉的PL光谱相比,从薄膜上观察到的PL光谱的峰值波长略有偏移,这可能是由于荧光粉的变化所致。晶体场。在100摄氏度的基板温度和20毫托的氩气分压下,样品的PL强度最高。因此,在恒定的基板温度100℃下研究了氩分压的影响,同时分别在20 mTorr的氩气压力下记录了基板温度的影响。 (C)2015 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号