...
首页> 外文期刊>Physica, B. Condensed Matter >Influence of annealing temperature on photoluminescence properties and optical constants of N-doped ZnO thin films grown on muscovite mica substrates
【24h】

Influence of annealing temperature on photoluminescence properties and optical constants of N-doped ZnO thin films grown on muscovite mica substrates

机译:退火温度对白云母云母衬底上生长的N掺杂ZnO薄膜的光致发光性质和光学常数的影响

获取原文
获取原文并翻译 | 示例
           

摘要

A sol-gel spin-coating method was used to synthesize N-doped ZnO (NZO) thin films on muscovite mica substrates; the films were then annealed at 200, 300, 400, and 500 degrees C. The effects of the annealing temperature on their photoluminescence properties and optical constants were investigated. All the films had strong UV emissions in their photoluminescence spectra, but the green emissions at similar to 2.4 eV were observed only for the annealed films. The average transmittance of all the films was about 80% in the visible range and the absorption edges in the UV range at 375 nm depended strongly on the annealing temperature. The optical band gap of the films decreased gradually as the annealing temperature was increased up to 400 degrees C, and the Urbach energy decreased significantly as the annealing temperature increased. Finally, the various optical constants, the dielectric constant, and the optical conductivity were measured for the un-annealed film and the film annealed at 500 degrees C. (C) 2015 Published by Elsevier B.V.
机译:采用溶胶-凝胶旋涂法在白云母云母基底上合成了N掺杂ZnO(NZO)薄膜。然后将膜在200、300、400和500摄氏度下退火。研究了退火温度对其光致发光性能和光学常数的影响。所有薄膜在其光致发光光谱中都具有很强的紫外线发射,但是仅对于退火薄膜,观察到的绿光发射接近2.4 eV。所有薄膜的平均透射率在可见光范围内约为80%,而在375 nm的UV范围内的吸收边缘在很大程度上取决于退火温度。薄膜的光学带隙随着退火温度的升高而逐渐降低,直到400摄氏度,而Urbach能量随着退火温度的升高而显着降低。最后,对未退火的膜和在500℃下退火的膜测量各种光学常数,介电常数和光学导率。(C)2015由Elsevier B.V.出版。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号