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Thermally induced effects on structural and electrical properties of selenium-rich Cd-Se thin films

机译:热诱导对富硒Cd-Se薄膜的结构和电性能的影响

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The effect of annealing in nitrogen atmosphere on structural and electrical properties of selenium rich CdSe (SR-CdSe) thin films deposited by thermal evaporation onto glass substrates were studied. X-ray diffraction (XRD) patterns showed that the as-prepared films were amorphous, whereas the annealed films were polycrystalline. Analyzing XRD patterns reveals the coexistence of both Se and CdSe crystalline phases which exhibits a hexagonal structure. The microstructure parameters (crystallite size, microstrain and dislocation density) were calculated for annealed films. Temperature dependence (300500 K) of d.c. conductivity was studied for as-prepared and annealed thin films. The experimental results indicate that the electrical conduction taking place through thermally activated process. At higher temperatures, electrical conduction for as-prepared film is taking place in the extended states while localized states conduction in the band tails is most likely to take place for annealed films. Regarding the lower temperature range, conduction by hopping in the localized states near the Fermi level is found to be dominant. Thus, conductivity data in this range was analyzed using Motts variable range hopping conduction, where Motts parameters were calculated for SR-CdSe thin films.
机译:研究了在氮气氛中退火对通过热蒸发沉积在玻璃基板上的富硒CdSe(SR-CdSe)薄膜的结构和电性能的影响。 X射线衍射(XRD)图表明,所制备的膜是非晶的,而退火的膜是多晶的。分析XRD图谱显示出呈现六边形结构的Se和CdSe晶相共存。计算退火薄膜的微观结构参数(微晶尺寸,微应变和位错密度)。直流的温度依赖性(300500 K)研究了制备和退火薄膜的电导率。实验结果表明,导电是通过热激活过程发生的。在较高的温度下,所制备薄膜的导电在扩展状态下发生,而带状尾部的局部导电最可能发生在退火后的薄膜上。关于较低的温度范围,发现在费米能级附近的局部状态中通过跳变进行的传导占主导。因此,使用Motts可变范围跳变传导分析了该范围内的电导率数据,其中为SR-CdSe薄膜计算了Motts参数。

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