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Indium slabs induced structural phase transitions and their effects on the electrical and optical properties of stacked layers of the thermally annealed Cu 2O thin films

机译:铟板诱导的结构相变及其对热退火的堆叠层的电气和光学性质的影响 2 O薄膜

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In this work, the effects of the structural evolutions caused by the insertion of indium slabs (100?nm) between layers of cupric oxide on the electrical and optical properties are investigated. The stacked layers of Cu2O/Cu2O (CC) which are thermally annealed at 500?°C in a vacuum media is observed to comprise both of the CuO (45.9%) and Cu2O (54.1%) phases in its structure. The major structural phase of CuO and Cu2O are monoclinic and orthorhombic, respectively. Insertion of indium slabs which is followed by thermal annealing reduced the content of CuO to 29.2% and enriched the content of Cu2O to 70.8%. The CC samples exhibited structural phase transitions from monoclinic CuO to hexagonal Cu2O in the presence of indium and under thermal annealing. The insertion of indium slabs in the samples increased the crystallite size and enhanced the optical transmittance. It also decreased the microstrain, the defect density and the electrical resistivity. The donor states are shifted deeper below the conduction band edge. The nature of optical transitions also changed from direct allowed to direct forbidden with a decrease in the energy band gap values from 2.05 to 0.85?eV upon indium slabs insertion followed by annealing process.
机译:在这项工作中,研究了通过在电和光学性质的层层之间插入铟板(100≤nm)之间的结构演变的影响。观察到在真空培养基中在500℃下热退火的Cu2O / Cu 2 O(CC)的堆叠层,其在其结构中包含CuO(45.9%)和Cu 2 O和Cu 2 O(54.1%)相。 CuO和Cu2O的主要结构阶段分别是单斜晶醇和正交的。将铟板的插入随后的热退火减少了CuO至29.2%的含量,并富集了Cu2O至70.8%的含量。 CC样品在铟和在热退火的情况下表现出从单斜替替尼CuO到六边形Cu2O的结构相转变。在样品中插入铟板增加了微晶尺寸并增强了光学透射率。它还降低了微纹,缺陷密度和电阻率。施主状态在导通带边缘下方更深。光学过渡的性质也从直接变化到直接禁止禁止在铟插入铟插入时从2.05到0.85的电能带隙值的减小。

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