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Lattice dislocation in Si nanowires

机译:硅纳米线中的乳胶位错

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摘要

Modified formulas were used to calculate lattice thermal expansion, specific heat and Bulk modulus for Si nanowires with diameters of 115, 56, 37 and 22 nm. From these values and Gruneisen parameter taken from reference, mean lattice volumes were found to be as 20.03 A~3 for the bulk and 23.63, 29.91, 34.69 and 40.46 A~3 for Si nanowire diameters mentioned above, respectively. Their mean bonding length was calculated to be as 0.235nm for the bulk and 0.248, 0.269, 0.282 and 0.297 nm for the nanowires diameter mentioned above, respectively. By dividing the nanowires diameter on the mean bonding length, number of layers per each nanowire size was found to be as 230, 104, 65 and 37 for the diameters mentioned above, respectively. Lattice dislocations in 22nm diameter wire were found to be from 0.00324nm for the 1st central lattice to 0.2579nm for the last surface lattice. Such dislocation was smaller for larger wire diameters. Dislocation concentration found to change in Si nanowires according to the proportionalities of surface thickness to nanowire radius ratios.
机译:修改后的公式用于计算直径为115、56、37和22 nm的Si纳米线的晶格热膨胀,比热和体积模量。从这些值和从参考中获得的Gruneisen参数,发现对于上述Si纳米线直径,平均晶格体积分别为20.03 A〜3和23.63、29.91、34.69和40.46 A〜3。计算出的它们的平均键合长度对于上述本体为0.235nm,对于上述纳米线直径分别为0.248、0.269、0.282和0.297nm。通过将纳米线的直径除以平均键合长度,发现每种直径的纳米线的层数分别为上述直径的230、104、65和37。发现直径为22nm的导线中的晶格位错从第一个中心晶格的0.00324nm到最后一个表面晶格的0.2579nm。对于较大的线径,这种位错较小。发现Si纳米线中的位错浓度根据表面厚度与纳米线半径之比的比例而变化。

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