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Mechanical properties of some binary, ternary and quaternary III-V compound semiconductor alloys

机译:某些二元,三元和四元III-V化合物半导体合金的机械性能

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Vicker's microindentation tests have been carried out on InP/InP, GaAs/InP, InGaAs/InP and InGaAsP/InP III-V compound semiconductor alloys. The detailed mechanical properties of these binary, ternary and quaternary epilayers were determined from the indentation experiments. Microindentation studies of (111) GaAs/InP both A and B faces show that the hardness value increases with load and attains a constant for further increase in load and the microhardness values were found to lie between 3.5 and 4.0 GPa. The microhardness values of InGaAs/InP epilayers with different thickness were found to lie between 3.93 and 4.312 GPa. The microhardness values of InGaAsP/InP with different elemental composition were found to lie between 5.08 and 5.73 GPa. The results show that the hardness of the quaternary alloy drastically increases, the reason may be that the increase in As concentration hardens the lattice when phosphorous concentration is less and hardness decreases when phosphorous is increased. It was interestingly observed that the hardness value increases as we proceed from binary to quaternary III-V compound semiconductor alloys. (c) 2006 Elsevier B.V. All rights reserved.
机译:维氏微压痕测试已在InP / InP,GaAs / InP,InGaAs / InP和InGaAsP / InP III-V化合物半导体合金上进行。这些二元,三元和四元外延层的详细机械性能由压痕实验确定。 (111)GaAs / InP的A和B面的显微压痕研究表明,硬度值随载荷的增加而增加,并达到恒定值,以进一步增加载荷,并且显微硬度值介于3.5和4.0 GPa之间。发现具有不同厚度的InGaAs / InP外延层的显微硬度值在3.93至4.312 GPa之间。发现具有不同元素组成的InGaAsP / InP的显微硬度值在5.08至5.73 GPa之间。结果表明,四元合金的硬度急剧增加,其原因可能是当磷浓度较小时,As浓度的增加使晶格硬化,而磷含量增加时,硬度降低。有趣的是,随着我们从二元到四元的III-V化合物半导体合金的发展,硬度值增加。 (c)2006 Elsevier B.V.保留所有权利。

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