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Radiation-induced defects in SiC-MESFETs after 2-MeV electron irradiation

机译:2 MeV电子辐照后SiC-MESFET中的辐射诱导缺陷

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The impact of radiation damage on the device performance of 4H-SiC metal Schottky field effect transistors, which are irradiated at room temperature with 2-MeV electrons, is studied. No performance degradation is observed by 1 x 10(15) e/cm(2), while a slight increase of the linear drain current together with a decrease of the threshold voltage are noticed for 1 x 10(16) e/cm(2). The degradation for low electron fluence is mainly attributed to the radiation-induced decrease of the Schottky barrier height at the gate contact. For exposures over 1 x 10(16) e/cm(2), the drain current and transconductance decrease. The maximum transconductance for 1 x 10(17) e/cm(2) is only 18% of the value before irradiation. Although no electron capture levels are observed before irradiation, three electron capture levels (E-1-E-3) are induced after irradiation. The observed increase of the channel resistance is due to the induced lattice defects creating electron traps. (c) 2005 Elsevier B.V. All rights reserved.
机译:研究了辐射损伤对4H-SiC金属肖特基场效应晶体管的性能的影响,该晶体管在室温下被2-MeV电子辐照。对于1 x 10(16)e / cm(2),没有观察到性能下降1 x 10(15)e / cm(2),而线性漏极电流略有增加,同时阈值电压也降低了。 )。低电子注量的降解主要归因于辐射引起的栅极接触处肖特基势垒高度的降低。对于超过1 x 10(16)e / cm(2)的曝光,漏极电流和跨导降低。 1 x 10(17)e / cm(2)的最大跨导仅为辐照前值的18%。尽管在照射前未观察到电子捕获水平,但是在照射后诱导了三个电子捕获水平(E-1-E-3)。观察到的沟道电阻的增加是由于感应的晶格缺陷产生了电子陷阱。 (c)2005 Elsevier B.V.保留所有权利。

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