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XAS of tetrakis(phenyl)- and tetrakis(pentafluorophenyl)-porphyrin: an experimental and theoretical study

机译:四(苯基)-和四(五氟苯基)-卟啉的XAS:实验和理论研究

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摘要

The unoccupied electronic structure of tetrakis(phenyl)-and tetrakis(pentafluorophenyl)-porphyrin thick films deposited on SiO2/Si(100) native oxide surfaces has been thoroughly studied by combining the outcomes of near-edge X-ray absorption fine structure spectroscopy at the C, N, and F K-edges with those of scalar relativistic zeroth order regular approximation time-dependent density functional theory calculations carried out on isolated molecules. Both experimental and theoretical results concur to stress the electronic inertness of pristine porphyrin macrocycle based 1s(C) -> pi* and 1s(N) -> pi* transitions whose excitation energies are substantially unaffected upon fluorination. The obtained results complement those published by the same group about the occupied states of both molecules, thus providing the missing tile to get a thorough description of the halide decoration effects on the electronic structure of the tetrakis(phenyl)-porphyrin.
机译:通过结合近边缘X射线吸收精细结构光谱的结果,深入研究了沉积在SiO2 / Si(100)天然氧化物表面上的四(苯基)-和四(五氟苯基)-卟啉厚膜的空位电子结构。 C,N和F K边以及对孤立分子进行的标量相对论零阶正则近似时间依赖密度泛函理论计算。实验和理论结果都强调基于原始卟啉大环的1s(C)-> pi *和1s(N)-> pi *跃迁的电子惰性,其激发能基本上不受氟化作用的影响。获得的结果补充了同一小组发表的关于两个分子的占据状态的结果,从而提供了缺失的图块,以全面描述卤化物对四(苯基)-卟啉电子结构的装饰作用。

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