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首页> 外文期刊>Physical chemistry chemical physics: PCCP >Enhanced hydrogen formation during the catalytic decomposition of H2O2 on metal oxide surfaces in the presence of HO radical scavengers
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Enhanced hydrogen formation during the catalytic decomposition of H2O2 on metal oxide surfaces in the presence of HO radical scavengers

机译:HO自由基清除剂存在下H2O2在金属氧化物表面催化分解过程中增强的氢形成

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Presently and for the foreseeable future, hydrogen peroxide and transition metal oxides are important constituents of energy production processes. In this work, the effect of the presence of HO radical scavengers on the product yield from the decomposition of H2O2 on metal oxide surfaces in aqueous solution was examined experimentally. Scavenging the intermediate product HO~· by means of Tris or TAPS buffer leads to enhanced formation of H2. In parallel, a decrease in the production of the main gaseous product O2 is observed. Under these conditions, H2 formation is a spontaneous process even at room temperature. The yields of both the H2 and O2 depend on the concentration of Tris or TAPS in the reaction media. We observed that TAPS has a higher affinity for the surface of ZrO2 than does Tris. The difference in adsorption of both scavengers is reflected by the difference in their influence on the product yields. The observed sensitivity of the system H2O2-ZrO2 towards the two different scavengers indicates that O2 and H2 are formed at different types of surface sites.
机译:目前和在可预见的将来,过氧化氢和过渡金属氧化物是能源生产过程的重要组成部分。在这项工作中,实验研究了HO自由基清除剂的存在对水溶液中金属氧化物表面H2O2分解产生的产物收率的影响。借助于Tris或TAPS缓冲液清除中间产物HO-导致增强的H 2形成。同时,观察到主要气态产物O 2的产量减少。在这些条件下,即使在室温下,H2的形成也是一个自发过程。 H2和O2的产率均取决于反应介质中Tris或TAPS的浓度。我们观察到,与Tris相比,TAPS对ZrO2表面的亲和力更高。两种清除剂对产品收率的影响差异反映了两种清除剂的吸附差异。观察到的系统H2O2-ZrO2对两种不同清除剂的敏感性表明,O2和H2是在不同类型的表面部位形成的。

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