Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements

摘要

We characterize the phase shift induced by reflection on a multilayer mirror in the extreme UV range (80-93 eV) using two techniques: one based on high order harmonic generation and attosecond metrology (reconstruction of attosecond beating by interference of two-photon transitions), and a second based on synchrotron radiation and measurements of standing waves (total electron yield). We find an excellent agreement between the results from the two measurements and a flat group delay shift (+-40 as) over the main reflectivity peak of the mirror.