Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry

摘要

We report the fabrication of low-loss amorphous silicon photonic wires deposited by plasma enhanced chemical vapor deposition. Single mode photonic wires were fabricated by 193 nm optical lithography and dry etching. Propagation loss measurements show a loss of 3.46 dB/cm for photonic wires (480 X 220 nm) and 1.34 dB/cm for ridge waveguides.