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Wrinkled single-layer graphenes fabricated by silicon nanopillar arrays

机译:由硅纳米柱阵列制造的起皱的单层石墨烯

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摘要

The degree of crumpling affects the optoelectronic properties of graphene, which are very important for the performance of graphene-based devices and materials. In this article, we report an approach to tune the formation of wrinkles on single-layer graphene (SLG) by silicon nanopillar (SNP) arrays. By using gold nanoparticles as an etching mask, SNP arrays with different heights could be prepared by tuning the duration of etching. The formation of wrinkles on these SNP arrays was studied systematically. We found that thermal treatment could lead to a wrapping behavior of graphene around SNP arrays, which was accompanied by the emergence of many more wrinkles. Controllable wettability, conductivity and transmittance were demonstrated. This ability to tune wrinkles using SNP arrays can be employed to engineer the fabrication of graphene-related devices and other optoelectronic applications.
机译:皱缩程度会影响石墨烯的光电性能,这对于基于石墨烯的器件和材料的性能非常重要。在本文中,我们报告了一种通过硅纳米柱(SNP)阵列调整单层石墨烯(SLG)上皱纹形成的方法。通过使用金纳米颗粒作为蚀刻掩模,可以通过调节蚀刻时间来制备具有不同高度的SNP阵列。系统研究了这些SNP阵列上的皱纹形成。我们发现热处理可能导致石墨烯在SNP阵列周围的包裹行为,并伴有更多皱纹的出现。证明了可控的润湿性,电导率和透射率。使用SNP阵列调节皱纹的能力可用于设计石墨烯相关器件的制造和其他光电应用。

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