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Influence of surface pre-treatment on the electronic levels in silicon MaWCE nanowires

机译:表面预处理对硅MaWCE纳米线中电子能级的影响

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Deep level transient spectroscopy (DLTS) was performed on n-doped silicon nanowires grown by metal-assisted wet chemical etching (MaWCE) with gold as the catalyst in order to investigate the energetic scheme inside the bandgap. To observe the possible dependence of the level scheme on the processing temperature, DLTS measurements were performed on the nanowires grown on a non-treated Au/Si surface and on a thermally pre-treated Au/Si surface. A noticeable modification of the configuration of the energy levels was observed, induced by the annealing process. Based on our results on these MaWCE nanowires and on literature data about deep levels in bulk silicon, some hypotheses were advanced regarding the identification of the defects responsible of the energy levels revealed.
机译:为了研究能带隙内的高能方案,对以金为催化剂的金属辅助湿法化学蚀刻(MaWCE)生长的n掺杂硅纳米线进行了深能级瞬态光谱分析(DLTS)。为了观察液位方案对处理温度的可能依赖性,对在未经处理的Au / Si表面和经过热处理的Au / Si表面上生长的纳米线进行DLTS测量。观察到由退火过程引起的能级构型的显着改变。基于我们对这些MaWCE纳米线的研究结果以及有关体硅深能级的文献数据,提出了一些关于确定所揭示能级的缺陷的假设。

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