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Position-dependent performance of copper phthalocyanine based field-effect transistors by gold nanoparticles modification

机译:纳米金修饰修饰酞菁铜基场效应晶体管的位置依赖性

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摘要

A facile fabrication and characteristics of copper phthalocyanine (CuPc)-based organic field-effect transistor (OFET) using the gold nanoparticles (Au NPs) modification is reported, thereby achieving highly improved performance. The effect of Au NPs located at three different positions, that is, at the SiO2/CuPc interface (device B), embedding in the middle of CuPc layer (device C), and on the top of CuPc layer (device D), is investigated, and the results show that device D has the best performance. Compared with the device without Au NPs (reference device A), device D displays an improvement of field-effect mobility (mu(sat)) from 1.65 x 10(-3) to 5.51 x 10(-3) cm(2) V-1 s(-1), and threshold voltage decreases from -23.24 to -16.12 V. Therefore, a strategy for the performance improvement of the CuPc-based OFET with large field-effect mobility and saturation drain current is developed, on the basis of the concept of nanoscale Au modification. The model of an additional electron transport channel formation by FET operation at the Au NPs/CuPc interface is therefore proposed to explain the observed performance improvement. Optimum CuPc thickness is confirmed to be about 50 nm in the present study. The device-to-device uniformity and time stability are discussed for future application.
机译:据报道,使用金纳米颗粒(Au NPs)修饰的基于铜酞菁(CuPc)的有机场效应晶体管(OFET)的制造工艺简单且具有特性,从而实现了性能的大幅提高。位于三个不同位置(即SiO2 / CuPc界面(设备B)),嵌入CuPc层中间(设备C)和CuPc层顶部(设备D)的Au NP的影响是进行了调查,结果表明设备D具有最佳性能。与没有Au NPs的设备(参考设备A)相比,设备D的场效应迁移率(mu(sat))从1.65 x 10(-3)改善到5.51 x 10(-3)cm(2)V -1 s(-1),阈值电压从-23.24 V降低到-16.12V。因此,在此基础上,开发了一种基于CuPc的场效应迁移率和饱和漏极电流大的OFET的性能改进策略。纳米金修饰的概念。因此,提出了在Au NPs / CuPc界面通过FET操作形成额外的电子传输通道的模型,以解释观察到的性能改进。在本研究中,确定最佳的CuPc厚度约为50 nm。讨论了设备到设备的一致性和时间稳定性,以备将来应用。

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