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Nanometre-scale identification of grain boundaries in MoS2 through molecular decoration

机译:通过分子修饰对MoS2中晶界的纳米级识别

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In this paper, we address the challenge of identifying grain boundaries on the molybdenum disulphide (MoS2) surface at the nanometre scale using a simple self-assembled monolayer (SAM) decoration method. Combined with atomic force microscopy, octadecylphosphonic acid monolayers readily reveal grain boundaries in MoS2 at ambient conditions, without the need of atomic resolution measurements under vacuum. Additional ab initio calculations allow us to obtain the preferred orientation of the SAM structure relative to the MoS2 beneath, and therefore, together with the experiments, the MoS2 crystalline orientations at the grain boundaries. The proposed method enables the visualization of grain boundaries with sub-micrometer resolution for nanodevice investigation and failure analysis.
机译:在本文中,我们解决了使用简单的自组装单层(SAM)装饰方法在纳米级识别二硫化钼(MoS2)表面上的晶界的挑战。与原子力显微镜相结合,十八烷基膦酸单层可轻松在环境条件下显示MoS2中的晶界,而无需在真空下进行原子分辨率测量。额外的从头计算可以让我们获得SAM结构相对于下面的MoS2的首选取向,因此,与实验一起,可以得出晶界处的MoS2晶体取向。所提出的方法能够以亚微米分辨率可视化晶界,用于纳米器件研究和失效分析。

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