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首页> 外文期刊>Nanotechnology >Thermal conductivity measurements of single-crystalline bismuth nanowires by the four-point-probe 3-ω technique at low temperatures
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Thermal conductivity measurements of single-crystalline bismuth nanowires by the four-point-probe 3-ω technique at low temperatures

机译:四点探针3-ω技术在低温下测量单晶铋纳米线的热导率

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We have successfully investigated the thermal conductivity (κ) of single-crystalline bismuth nanowires (BiNWs) with [110] growth direction, via a straightforward and powerful four-point-probe 3-ω technique in the temperature range 10-280 K. The BiNWs, which are well known as the most effective material for thermoelectric (TE) device applications, were synthesized by compressive thermal stress on a SiO2/Si substrate at 250-270°C for 10 h. To understand the thermal transport mechanism of BiNWs, we present three kinds of experimental technique as follows, (i) a manipulation of a single BiNW by an Omni-probe in a focused ion beam (FIB), (ii) a suspended bridge structure integrating a four-point-probe chip by micro-fabrication to minimize the thermal loss to the substrate, and (iii) a simple 3-ω technique system setup. We found that the thermal transport of BiNWs is highly affected by boundary scattering of both phonons and electrons as the dominant heat carriers. The thermal conductivity of a single BiNW (d ~ 123 nm) was estimated to be ~2.9 W m~(-1) K~(-1) at 280 K, implying lower values compared to the thermal conductivity of the bulk (~11 W m~(-1) K~(-1) at 280 K). It was noted that this reduction in the thermal conductivity of the BiNWs could be due to strongly enhanced phonon-boundary scattering at the surface of the BiNWs. Furthermore, we present temperature-dependent (10-280 K) thermal conductivity of the BiNWs using the 3-ω technique.
机译:我们已经通过一种简单而强大的四点探针3-ω技术在10-280 K的温度范围内成功研究了具有[110]生长方向的单晶铋纳米线(BiNWs)的导热率(κ)。 BiNWs是众所周知的热电(TE)器件应用中最有效的材料,它是通过在SiO2 / Si衬底上于250-270°C下压缩热应力10 h来合成的。为了了解BiNW的热传递机理,我们提出了以下三种实验技术:(i)用全探针在聚焦离子束(FIB)中对单个BiNW进行操纵,(ii)集成了悬浮桥结构的通过微细加工制成的四点探针芯片,以最大程度地减少对基板的热损失;以及(iii)简单的3-ω技术系统设置。我们发现,BiNWs的热传输受到声子和作为主要载热体的电子的边界散射的高度影响。单个BiNW(d〜123 nm)的热导率在280 K时估计为〜2.9 W m〜(-1)K〜(-1),与整体的热导率相比较低(〜11 W m〜(-1)K〜(-1)在280 K)。注意到BiNW的热导率的这种降低可能是由于BiNW的表面处的声子边界散射大大增强。此外,我们提出了使用3-ω技术的BiNWs的温度依赖性(10-280 K)导热系数。

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