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Plasmonic layers based on Au-nanoparticle-doped TiO_2 for optoelectronics: Structural and optical properties

机译:用于光电子学的基于金纳米粒子掺杂的TiO_2的等离子层:结构和光学性质

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摘要

The anti-reflective effect of dielectric coatings used in silicon solar cells has traditionally been the subject of intensive studies and practical applications. In recent years the interest has permanently grown in plasmonic layers based on metal nanoparticles, which are shown to increase light trapping in the underlying silicon. In the present work we have combined these two concepts by means of in situ synthesis of Au nanoparticles in a dielectric matrix (TiO_2), which is commonly used as an anti-reflective coating in silicon solar cells, and added the third element: a 10-20% porosity in the matrix. The porosity is formed by means of a controllable wet etching by low concentration HF. As a consequence, the experimentally measured reflectance of silicon coated by such a plasmonic layer decreases to practically zero in a broad wavelength region around the localized surface plasmon resonance. Furthermore, we demonstrate that extinction and reflectance spectra of silicon coated by the plasmonic films can be successfully accounted for by means of Fresnel formulae, in which a double refractive index of the metal-dielectric material is used. This double refractive index cannot be explained by effective medium theory (Maxwell-Garnett, for example) and appears when the contribution of Au nanoparticles located at the TiO_2/Si interface is high enough to result in formation of interface surface plasmon modes.
机译:传统上,用于硅太阳能电池的介电涂层的抗反射作用一直是深入研究和实际应用的主题。近年来,人们对基于金属纳米粒子的等离激元层的兴趣不断增长,这些层被证明会增加下层硅中的光捕获。在当前的工作中,我们通过在电介质基体(TiO_2)中原位合成Au纳米粒子的方法将这两个概念结合在一起,该基体通常用作硅太阳能电池中的抗反射涂层,并添加了第三个元素:10基质中的孔隙率为-20%。孔隙率是通过可控的低浓度HF湿法蚀刻而形成的。结果,在局部表面等离子体激元共振周围的宽波长区域中,由这种等离子体层涂覆的硅的实验测量的反射率实际上降低至零。此外,我们证明了可以通过菲涅耳公式成功地解释了由等离激元薄膜覆盖的硅的消光和反射光谱,其中使用了金属介电材料的双折射率。这种双折射率不能用有效的介质理论(例如Maxwell-Garnett)来解释,并且当位于TiO_2 / Si界面的Au纳米粒子的贡献足够高而导致形成界面表面等离振子模式时,就会出现这种双折射率。

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