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首页> 外文期刊>Electrochimica Acta >Analyzing Cd underpotential deposition behavior on Se thin-films: Atomic force microscopy, cyclic voltammetry and electrochemical quartz crystal nanobalance studies
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Analyzing Cd underpotential deposition behavior on Se thin-films: Atomic force microscopy, cyclic voltammetry and electrochemical quartz crystal nanobalance studies

机译:分析硒薄膜上镉的低电位沉积行为:原子力显微镜,循环伏安法和电化学石英晶体纳米天平研究

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Cd UPD on selenium was studied for an Au-EQCN modified electrode with Se thin-films previously deposited in acid media. The relationship between AFM, cyclic voltammetry and EQCN data provided an analysis of Cd UPD on a semiconductive layer. EQCN measurements demonstrated that the increase of mass during the potentiostatic deposition in UPD conditions was larger than expected for the maximum recovery allowed (i.e. 0.17 ML), which was related to diffusion through the Se thin-film. From AFM data it was possible to normalize voltammetric and gravimetric data, and our results were consistent with a controlled electrodeposition of CdSe structures. The result of the Cd UPD process was a controlled amount of CdSe. In addition, these findings also demonstrated that electrodeposition in UPD conditions can be used as a helpful technique in order to improve control in surface engineering.
机译:研究了硒上的镉UPD用于Au-EQCN修饰的电极,该电极具有预先沉积在酸性介质中的Se薄膜。 AFM,循环伏安法和EQCN数据之间的关系提供了对半导体层上Cd UPD的分析。 EQCN测量表明,在UPD条件下恒电位沉积过程中质量的增加大于允许的最大回收率(即0.17 ML),这与通过Se薄膜的扩散有关。从原子力显微镜数据可以归一化伏安和重量数据,我们的结果与CdSe结构的受控电沉积是一致的。 Cd UPD工艺的结果是控制量的CdSe。此外,这些发现还表明,在UPD条件下进行电沉积可作为一种有用的技术,以改善对表面工程的控制。

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