首页> 外文期刊>Electrochimica Acta >Microstructure and properties of carbon-sulfur-containing chromium deposits electroplated in trivalent chromium baths with thiosalicylic acid
【24h】

Microstructure and properties of carbon-sulfur-containing chromium deposits electroplated in trivalent chromium baths with thiosalicylic acid

机译:在三价铬浴中用硫代水杨酸电镀的含碳硫铬沉积物的组织和性能

获取原文
获取原文并翻译 | 示例
           

摘要

The chromium-carbon-sulfur (Cr-C-S) deposits were electroplated from a trivalent Cr bath containing thiosalicylic acid. In the absence of thiosalicylic acid, the Cr-C deposit was amorphous and contained a significant amount of C. The Cr-C-S deposit plated in the bath containing thiosalicylic acid displayed a crystalline structure and was mainly composed of Cr, C, S, and oxygen. The presence of thiosalicylic acid in the bath apparently reduced the codeposition of C, which, in turn, enhanced the crystallinity of the Cr-C-S deposit. Furthermore, the codeposited S influenced the microstructure and properties of the deposits. The internal stress and population density of cracks of the deposit were reduced as more thiosalicylic acid was added in the trivalent Cr bath. Moreover, the corrosion potential was enhanced and the corrosion current density and the passivation current density were reduced with increasing bath thiosalicylic acid concentration. As a result, the crystalline, crack-free Cr-C-S deposit exhibited a better corrosion resistance than the amorphous Cr-C deposit.
机译:从含有硫代水杨酸的三价Cr浴中电镀出铬-碳-硫(Cr-C-S)沉积物。在不存在巯基水杨酸的情况下,Cr-C沉积物是无定形的,并含有大量的C。镀在含有巯基水杨酸浴中的Cr-CS沉积物显示出晶体结构,主要由Cr,C,S和C组成。氧。浴中硫代水杨酸的存在显然减少了C的共沉积,这反过来又提高了Cr-C-S沉积物的结晶度。此外,共沉积的S影响了沉积物的微观结构和性质。随着在三价铬镀液中添加更多的硫代水杨酸,降低了沉积物的内部应力和裂纹的密度。此外,随着浴中硫代水杨酸浓度的增加,腐蚀电位增强,腐蚀电流密度和钝化电流密度降低。结果,结晶的,无裂纹的Cr-C-S沉积物比非晶态的Cr-C沉积物表现出更好的耐腐蚀性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号