3 ELECTROPLATING BATH CONTAINING TRIVALENT CHROMIUM AND PROCESS FOR DEPOSITING CHROMIUM

摘要

The present invention relates to an electroplating bath for depositing chromium comprising at least one trivalent chromium salt, at least one complexing agent, at least one halogen salt and optionally further additives. (electroplating bath). In addition, the present invention relates to a method of depositing chromium on a substrate using the electroplating bath (electroplating bath).