ELECTROPLATING BATH CONTAINING TRIVALENT CHROMIUM AND PROCESS FOR DEPOSITING CHROMIUM

摘要

The present invention refers to an electroplating bath for depositing chromium which comprises at least one trivalent chromium salt, at least one complexing agent, at least one halogen salt and optionally further additives. Moreover, the invention refers to a process for depositing chromium on a substrate using the mentioned electroplating bath.