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Conditions for Ta-IV-Ta-IV Bonding in Trirutile LixMTa2O6

机译:conditions for ta-IV-ta-IV bonding int日入tile l IX MTA2O6

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摘要

Stabilization of Ta-Ta bonding in an oxide across a shared octahedral-site edge of a Ta-2 dimer is not known. Investigation of Li insertion into the trirutile structure of MTa2O6 with M = Mg, Cr, Fe, Co, and Ni indicates that Ta-Ta bonding across the shared octahedral-site edge of the dimer can be stabilized by a reversible electrochemical reduction of Ta-V to Ta-IV for M = Cr, Fe, Co, and Ni but not for M = Mg. Chemical reduction of MTa2O6 by n-butyl lithium only reduced NiTa2O6 to any significant extent. With M = Fe, Co, or Ni, electrochemical formation of the Ta-Ta bonds is accompanied by a partial reduction of the Fe-II, Co-II, or Ni-II to Fe-0, Co-0, or Ni-0. For M = Cr, two Li per formula unit can be inserted reversibly with no displacement of Cr-0. For M = Mg, no Mg-II are displaced by Li insertion, but a solid-electrolyte interphase (SEI) layer is formed on the oxide with no evidence of Ta-Ta bonding. Stabilization of Ta-Ta bonding across a shared octahedral-site edge in a dimer appears to require significant hybridization of the Ta-V 5d(0) and M 4s(0) states.
机译:跨过Ta-2二聚体的共享八面体位点边缘的氧化物中的Ta-Ta键的稳定性尚不清楚。将Li插入M = Mg,Cr,Fe,Co和Ni的MTa2O6三元结构中的研究表明,通过可逆的Ta-Ta的可逆电化学还原,可稳定跨二聚体共享八面体位边缘的Ta-Ta键对于M = Cr,Fe,Co和Ni,从V到Ta-IV,但对于M = Mg,则不是。用正丁基锂对MTa2O6进行化学还原只会在很大程度上减少NiTa2O6。在M = Fe,Co或Ni的情况下,Ta-Ta键的电化学形成伴随有Fe-II,Co-II或Ni-II部分还原为Fe-0,Co-0或Ni- 0。如果M = Cr,则每个公式单位可插入两个Li,而Cr-0的位移不变。对于M = Mg,没有任何Mg-II被Li插入所取代,但是在氧化物上形成了固体电解质中间相(SEI)层,没有Ta-Ta键的迹象。跨二聚体中共享八面体位点边缘的Ta-Ta键的稳定化似乎需要Ta-V 5d(0)和M 4s(0)状态的显着杂交。

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