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Density functional Study on electronic properties of P-doped spinel silicon carbon nitride

机译:P掺杂尖晶石碳氮化硅电子性能的密度泛函研究

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We performed density functional calculations on the electronic properties of P-doped spinel silicon carbon nitride. When Si is replaced by C at the tetrahedral sites of P-doped c-Si3N4, the band gap can be adjusted, and an insulator-to-metal transition is predicted to occur at the C-to-Si ratio of 0.27. Finally, some possible examinations and potential applications for the large band-gap reduction are discussed. (C) 2007 Elsevier Inc. All rights reserved.
机译:我们对掺杂P的尖晶石碳氮化硅的电子性能进行了密度泛函计算。当在掺杂P的c-Si3N4的四面体位置上用C代替Si时,可以调节带隙,并且可以预测C / Si比为0.27时会发生绝缘体到金属的转变。最后,讨论了大带隙减小的一些可能的检查方法和潜在应用。 (C)2007 Elsevier Inc.保留所有权利。

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