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Electrochromic and optical properties of tungsten oxide films deposited with DC sputtering by introducing hydrogen

机译:直流溅射氢沉积氧化钨薄膜的电色和光学性质。

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Research was undertaken to investigate the electrochromic and optical properties of tungsten oxide (WO_3) films deposited by introducing hydrogen with a direct current (DC) and pulsed DC sputtering. The results show that WO_3 films have optimum electrochromic properties at a hydrogen flow of 4 and 3 sccm for DC and pulsed DC, respectively. In the Raman spectra, the peak intensity increased with the increase of hydrogen flow at both 770 cm~1 and 950 cm~(-1) peaks, which resulted in bonds of W~(6+)-O and W~(+6) = O, respectively. Simultaneously, the transmittance (ΔT_(550 nm)) variations were 65.6% and 64.4%, and the average transmittance (ΔT_(400-500 nm)) variations were 56.7% and 56.4% for DC and pulsed DC, respectively. The bleached/colored ability of the cyclic voltammograms (CVs) was DC > pulsed DC, and the resistances of AC impedance were pulsed DC > DC.
机译:进行了研究以研究通过在直流电(DC)中引入氢和脉冲直流溅射法沉积的氧化钨(WO_3)膜的电致变色和光学性质。结果表明,WO_3膜在氢气流分别为4和3 sccm时对于DC和脉冲DC具有最佳的电致变色性能。在拉曼光谱中,在770 cm〜1和950 cm〜(-1)峰处,峰强度随氢流的增加而增加,从而导致W〜(6 +)-O和W〜(+6)的键合。 )=O。同时,直流和脉冲直流的透射率(ΔT_(550 nm))变化分别为65.6%和64.4%,平均透射率(ΔT_(400-500 nm))变化分别为56.7%和56.4%。循环伏安图(CV)的漂白/着色能力为DC>脉冲DC,AC阻抗的电阻为脉冲DC> DC。

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