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首页> 外文期刊>Applied optics >Empirical equations for the principal refractive indies and column angle of obliquely deposited films of tantalum oxide, titanium oxide, and zirconium oxide
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Empirical equations for the principal refractive indies and column angle of obliquely deposited films of tantalum oxide, titanium oxide, and zirconium oxide

机译:氧化钽,氧化钛和氧化锆倾斜沉积膜的主要折射率和列角的经验方程式

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摘要

Values of the transmittance T↓(s) and the phase retardation a were recorded in situ at two angles during the growth, of thin rims of tantalum oxide, titanium oxide, and zirconium oxide for deposition angles 0, in the range40°-70°. Column angles for the same films were determined ex situ from scanning electron microscopy photographs of deposition-plane fractures. We show that the experimental column angles are smaller than the corresponding values predicted by the tangent-rule equation#= tan↑(-l)(0.5 tan θ↓(v)) and that the experimental values fit a modified form of the equation#= tan↑(-l)(E↓(1) tan θ↓(v)) where E↓(1) is less than 0.5. We also show that the principal refractive indices are represented well by quadratic functions of the deposition.angle, for example, n↓(v)(θ↓(v)) = A↓(θ) + A↓(2) θ↓(v)↑(2),#1998 Optical Society of America OCIS codes: 310.0310, 310.1620, 260.1440.
机译:在生长过程中以两个角度原位记录透射角T↓(s)和相位延迟a的值,其中沉积角为0的氧化钽,氧化钛和氧化锆的薄边缘在40°-70°范围内。从沉积平面裂缝的扫描电子显微镜照片非原位确定相同薄膜的柱角。我们证明实验列角小于切线规则方程式预测的相应值#= tan↑(-l)(0.5 tanθ↓(v)),并且实验值适合方程式的修改形式# = tan↑(-l)(E↓(1)tanθ↓(v))其中E↓(1)小于0.5。我们还表明,主要折射率由沉积的二次函数很好地表示。例如n↓(v)(θ↓(v))= A↓(θ)+ A↓(2)θ↓( v)↑(2),#1998美国光学学会OCIS代码:310.0310、310.1620、260.1440。

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