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Cluster Secondary Ion Mass Spectrometry and the Temperature Dependence of Molecular Depth Profiles

机译:团簇二次离子质谱和分子深度分布的温度依赖性

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The quality of molecular depth profiles created by erosion of organic materials by cluster ion beams exhibits a strong dependence upon temperature. To elucidate the fundamental nature of this dependence, we employ the Irganox 3114/1010 organic delta-layer reference material as a model system. This delta-layer system is interrogated using a 40 keV C_(60)~(+) primary ion beam. Parameters associated with the depth profile such as depth resolution, uniformity of sputtering yield, and topography are evaluated between 90 and 300 K using a unique wedge-crater beveling strategy that allows these parameters to be determined as a function of erosion depth from atomic force microscope (AFM) measurements. The results show that the erosion rate calibration performed using the known DELTA-layer depth in connection with the fluence needed to reach the peak of the corresponding secondary ion mass spectrometry (SIMS) signal response is misleading. Moreover, we show that the degradation of depth resolution is linked to a decrease of the average erosion rate and the buildup of surface topography in a thermally activated manner. This underlying process starts to influence the depth profile above a threshold temperature between 210 and 250 K for the system studied here. Below that threshold, the process is inhibited and steady-state conditions are reached with constant erosion rate, depth resolution, and molecular secondary ion signals from both the matrix and the DELTA-layers. In particular, the results indicate that further reduction of the temperature below 90 K does not lead to further improvement of the depth profile. Above the threshold, the process becomes stronger at higher temperature, leading to an immediate decrease of the molecular secondary ion signals. This signal decay is most pronounced for the highest m/z ions but is less for the smaller m/z ions, indicating a shift toward small fragments by accumulation of chemical damage. The erosion rate decay and surface roughness buildup, on the other hand, exhibit a rather sudden delayed onset after erosion of about 150 nm, indicating that a certain damage level must be reached in order to influence the erosion dynamics. Only after that onset does the depth resolution become compromised, indicating that the temperature reduction does not significantly influence parameters like ion-beam mixing or the altered-layer thickness. In general, the wedge-crater beveling protocol is shown to provide a powerful basis for increased understanding of the fundamental factors that affect the important parameters associated with molecular depth profiling.
机译:由簇离子束腐蚀有机材料而产生的分子深度分布图的质量表现出对温度的强烈依赖性。为了阐明这种依赖性的基本性质,我们采用Irganox 3114/1010有机δ-层参考材料作为模型系统。使用40 keV C_(60)〜(+)一次离子束询问该δ层系统。使用独特的楔形坑斜角策略,可以在90至300 K之间评估与深度轮廓相关的参数,例如深度分辨率,溅射产量的均匀性和形貌,该参数可以根据原子力显微镜确定的腐蚀深度确定这些参数(AFM)测量。结果表明,使用已知的DELTA层深度与达到相应的二次离子质谱(SIMS)信号响应的峰值所需的注量相关的腐蚀速率校准具有误导性。此外,我们表明,深度分辨率的降低与平均侵蚀率的降低和以热激活方式形成的表面形貌有关。对于本文研究的系统,此基础过程开始影响深度阈值温度在210和250 K之间的深度分布。低于该阈值,将抑制该过程,并以恒定的腐蚀速率,深度分辨率以及来自基质层和DELTA层的分子二次离子信号达到稳态条件。特别地,结果表明,温度进一步降低到90 K以下不会导致深度分布的进一步改善。高于阈值,该过程在较高温度下变得更强,导致分子二次离子信号立即下降。对于最高的m / z离子,此信号衰减最为明显,而对于较小的m / z离子,该信号衰减较小,这表明由于化学损伤的积累,向小碎片的转移。另一方面,腐蚀速率衰减和表面粗糙度的增加在腐蚀后大约150 nm处出现相当突然的延迟发作,表明必须达到一定的破坏水平才能影响腐蚀动力学。只有在此之后,深度分辨率才会受到损害,这表明温度降低不会显着影响诸如离子束混合或改变的层厚度之类的参数。通常,显示楔形坑斜角加工方案为进一步了解影响与分子深度分析相关的重要参数的基本因素提供了有力依据。

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