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Structure and Electrochemical Properties of Carbon Films Prepared by a Electron Cyclotron Resonance Sputtering Method

机译:电子回旋共振溅射法制备碳膜的结构和电化学性能

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This paper describes the characterization, electrochemical properties, and applications of carbon films prepared by the electron cyclotron resonance (ECR) sputtering method. The ECR-sputtered carbon film was deposited within several minutes at room temperature. The optimized sputtering conditions significantly change the film structure, which includes many more sp~(3) bonds (sp~(3)/sp~(2) velence 0.702) than previously reported film (sp~(3)/sp~(2) velence 0.274)~(1) with an extremely flat surface (0.7 A). The ECR-sputtered carbon films exhibit excellent electrochemical properties. For example, they have nearly the same potential window in the positive direction as that of high-quality, borondoped diamond (moderately doped, 10~(19)-10~(20) boron atoms/cm~(3))~(2) and an even wider potential window in the negative direction with a low background current, high stability, and suppression of fouling by electroactive species without pretreatment. The electron-transfer rates at ECR-sputtered carbon films are similar to those of glassy carbon (GC) for Ru(NH_(3))_(6)~(2+/3+) and Fe(CN)_(6)~(3-/4-), whereas they are much slower than those of GC for Fe~(2+/3+), dopamine oxidation, and O_(2) reduction due to weak interactions between electroactive species and the ECR-sputtered carbon film surface. Such a response can be attributed to the ultraflat surface and low surface O/C ratios of ECR-sputtered carbon films. ECR-sputtered carbon film is advantageous for measuring biochemicals with high oxidation potentials because of its wide potential window and high stability. Highly reproducible and well-defined cyclic voltammograms were obtained for histamine and azide ions with a peak potential at 1.25 and 1.12 V vs Ag/AgCl, respectively. The film is very stable for continuous voltammetry measurements in 10 (mu)M bisphenol A, which usually fouls the electrode surface with oxidation products.
机译:本文介绍了通过电子回旋共振(ECR)溅射方法制备的碳膜的表征,电化学性能及其应用。在室温下,在几分钟内沉积了ECR溅射的碳膜。优化的溅射条件显着改变了膜结构,与先前报道的膜(sp〜(3)/ sp〜(2)相比,膜结构包含更多的sp〜(3)键(sp〜(3)/ sp〜(2)velence 0.702)。速度0.274)〜(1),表面非常平整(0.7 A)。溅射ECR的碳膜具有出色的电化学性能。例如,它们在正方向上的电位窗口与高质量的硼化金刚石(中等掺杂的10〜(19)-10〜(20)硼原子/ cm〜(3))〜(2 ),并且在负方向上具有更大的电位窗口,具有低背景电流,高稳定性,并且无需预处理即可抑制电活性物质的结垢。对于Ru(NH_(3))_(6)〜(2 + / 3 +)和Fe(CN)_(6),在ECR溅射的碳膜上的电子传输速率与玻璃碳(GC)相似。 〜(3- / 4-),但是由于电活性物质和ECR溅射之间的相互作用较弱,Fe〜(2 + / 3 +),多巴胺氧化和O_(2)还原的速度要比GC慢得多碳膜表面。这种响应可归因于ECR溅射碳膜的超平表面和低表面O / C比。 ECR溅射碳膜具有宽的电势窗口和高稳定性,因此对于测量具有高氧化电势的生物化学药品具有优势。对于组胺和叠氮化物离子,分别获得了相对于Ag / AgCl的峰值电势分别为1.25和1.12 V的高度可重复且定义明确的循环伏安图。该膜对于10μM双酚A中的连续伏安法测量非常稳定,双酚A通常会使电极表面积聚氧化产物。

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