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首页> 外文期刊>Analytical chemistry >High-Speed Camera Imaging for Laser Ablation Process: For Further Reliable Elemental Analysis Using Inductively Coupled Plasma-Mass Spectrometry
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High-Speed Camera Imaging for Laser Ablation Process: For Further Reliable Elemental Analysis Using Inductively Coupled Plasma-Mass Spectrometry

机译:激光烧蚀过程的高速相机成像:使用电感耦合等离子体质谱法进行进一步可靠的元素分析

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Production of laser ablation-induced sample aerosols has been visualized using a high-speed camera device coupled with shadowgraphy technique. The time resolution of the method is 1 (mu)s, and production of the sample grains was successfully defined by the imaging system. An argon-fluoride excimer laser operated at 193-nm wavelength was used to ablate the solid samples. When the laser was shot onto the sample (Si wafer), a dome-shaped dark area appeared at the ablation pit. This dark area reflects changes in refractive index of ambient He probably due to emission of electrons or ions from the ablation pit. The dark area expanded hemispherically from the ablation pit with a velocity close to the speed of sound (approx1000 m/s for He at 300 K). This was followed by the excitation or ionization of the vaporized sample, known as the plasma plume. Immediately after the formation of the plasma plume, sample aerosols were produced and released from the ablation pit along the propagation of the laser-induced shockwave. Production of the sample aerosols was significantly delayed (approx4 (mu)s) from the onset of the laser shot. The typical speed of particles released from the ablation pit was 100-200 m/s, which was significantly slower than the reported velocity of the plasma plume expansion (10~(4) m/s). Since the initial measured speed of the sample particles was rather close to the speed of sound, the sample aerosols could be rapidly decelerated to the terminal velocity by a gas drag force with ambient He. The release angle of the sample aerosols from the ablation pit was very shallow (<10 deg), which may be due to the downforce produced by the thermal expansion of the ambient gas above the ablation pit. The shallower release angle and the contribution of the downforce probably results in the redeposition of sample aerosols or vapor around the ablation pit. In fact, the degree of sample redeposition around the ablation pit can be effectively minimized by evacuation the sample cell down to 20 kPa. In the case of glass samples, almost no visible laser-induced sample particles could be found using the spatial resolution of our device. This was mainly due to the smaller size distribution of the sample aerosols from the glass materials. Differences in size distribution of the sample aerosols between Si wafers and glass materials can affect analytical sensitivity and precision of elemental analyses using the laser ablation-ICP-mass spectrometry (LA-ICPMS). Although details of the mechanism of production and release of the sample aerosols from the ablation pit are not fully understood, the present imaging device for laser ablation has various implications for further precise elemental and isotopic analyses using LA-ICPMS.
机译:激光烧蚀诱导的样品气溶胶的生产已经通过使用高速摄影机设备结合影印技术进行了可视化。该方法的时间分辨率为1μs,并且通过成像系统成功地确定了样品颗粒的产生。使用在193 nm波长下操作的氟化氩准分子激光烧蚀固体样品。当激光束照射到样品(硅晶片)上时,在消融坑处会出现圆顶状的暗区。该暗区反映了环境He折射率的变化,这可能是由于消融坑中电子或离子的发射所致。暗区从烧蚀坑向半球形扩展,其速度接近声速(He在300 K时约为1000 m / s)。之后是激发或电离的汽化样品,称为等离子羽流。在等离子羽流形成后,立即产生了样品气溶胶,并沿激光诱导的冲击波传播将其从消融坑中释放出来。从激光发射开始,样品气雾剂的生产就大大延迟了(约4μs)。从消融坑释放的颗粒的典型速度为100-200 m / s,这比所报道的等离子羽流膨胀速度(10〜(4)m / s)明显慢。由于样品颗粒的初始测量速度非常接近于声速,因此样品气溶胶可以通过环境He的气体拖曳力迅速减速至最终速度。样品气溶胶从消融坑的释放角非常浅(<10度),这可能是由于周围气体在消融坑上方的热膨胀所产生的下压力。较浅的释放角和下压力的作用可能导致样品气溶胶或蒸气在烧蚀坑周围重新沉积。实际上,通过将样品池排空至20 kPa,可以有效地最小化消融坑周围的样品再沉积程度。对于玻璃样品,使用我们设备的空间分辨率几乎看不到可见的激光诱导样品颗粒。这主要是由于来自玻璃材料的样品气溶胶的尺寸分布较小。硅晶片和玻璃材料之间样品气溶胶的尺寸分布差异会影响使用激光烧蚀-ICP-质谱(LA-ICPMS)进行元素分析的分析灵敏度和精度。尽管尚未完全了解样品气溶胶从消融坑产生和释放的机理的细节,但是本发明的用于激光消融的成像设备对于使用LA-ICPMS进行进一步的精确元素和同位素分析具有各种意义。

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