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Time-Dependent Scattering of Ultrathin Gold Film under Potential Perturbation

机译:潜在扰动下超薄金膜的时变散射

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摘要

Shifts of the plasmon scattering band of ultrathin gold films under the effect of dynamic applied potential were studied in single wavelength measurements. The effect on scattering of applied potential was ascribed to electronic charging and discharging of the gold film. Scattering transients in response to square-wave potential modulation had an exponential form which depended on the potential step width, the modulation frequency and the nature of the ions. The presence of an AC signal component induced by ±10 mV potential modulated at 2 kHz indicated the capability of very thin gold film to respond to high frequency voltage.
机译:在单波长测量中研究了动态施加电势作用下超薄金膜的等离激元散射带的位移。对施加电势的散射的影响归因于金膜的电子充电和放电。响应方波电势调制的散射瞬变具有指数形式,该形式取决于电势步长,调制频率和离子的性质。由以2 kHz调制的±10 mV电势引起的交流信号分量的存在表明,很薄的金膜能够响应高频电压。

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