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Indium Implantation onto Zeolite by Pulse Arc Plasma Process for the Development of Novel Catalysts

机译:脉冲电弧等离子体法将铟注入沸石制备新型催化剂

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摘要

Chemical substances that contain both indium (In) and silicon (Si) in close proximity catalyze certain organic chemical reactions. The implantation of In onto zeolite containing Si atoms was carried out by a pulse arc plasma process for the possible development of novel catalysts. X-ray photoelectron spectroscopy of the In-implanted zeolite revealed that In was successfully implanted. In addition, the In-implanted zeolite was capable of catalyzing an organic chemical reaction (i.e., Friedel-Crafts alkylation).
机译:同时包含铟(In)和硅(Si)的化学物质催化某些有机化学反应。通过脉冲电弧等离子体工艺将In注入到含Si原子的沸石上,以可能开发新型催化剂。注入的沸石的X射线光电子能谱表明In被成功注入。另外,植入式沸石能够催化有机化学反应(即,弗瑞德-克来福特烷基化)。

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