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Direct characterizations of GaN lattice-polarity and its applications by atomic-resolution high-voltage electron microscopy

机译:GaN晶格极性的直接表征及其在原子分辨率高压电子显微镜下的应用

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摘要

We succeeded in directly characterizing GaN lattic-polarity by atomic-resolution high-voltage electron microscopy(ARHVEM). By the use of the method, we characterized the structural properties of MBE-grown GaN films with different lattice-polarity. It is clear that inversion domains in the film give great negative influences on the film qualities. Furthermore, the mechanism of the inverse of the lattice-polarity by In-irradiation during the growth was studied by ARHVEM observations.
机译:我们成功地通过原子分辨高压电子显微镜(ARHVEM)直接表征了GaN晶格极性。通过使用该方法,我们表征了具有不同晶格极性的MBE生长的GaN膜的结构特性。显然,膜中的反转域对膜质量产生很大的负面影响。此外,通过ARHVEM观测研究了生长期间In-辐照引起的晶格极性反转的机理。

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